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高能氮离子轰击对四面体非晶碳膜的表面改性和摩擦系数影响的研究

韩亮 陈仙 杨立 王炎武 王晓艳 赵玉清

物理学报2011,Vol.60Issue(6):584-588,5.
物理学报2011,Vol.60Issue(6):584-588,5.

高能氮离子轰击对四面体非晶碳膜的表面改性和摩擦系数影响的研究

Surface modification and the friction coefficient of tetrahedral amorphous carbon films bombarded by energetic N ion

韩亮 1陈仙 2杨立 1王炎武 1王晓艳 1赵玉清1

作者信息

  • 1. 西安交通大学电子与信息工程学院电子物理与器件教育部重点实验室,西安710049
  • 2. 西安电子科技大学技术物理学院,西安710071
  • 折叠

摘要

Abstract

The ta-C films with more than 80% sp3 fraction were deposited by FCVA technique, and then were bombarded by energetic N ion. The composition and structure of the ta-C films prior to and after the bombardment of energetic N ion is analyzed by x-ray photoelectron spectroscopy. The surface morphology is investigated by Atomic force microscopy . The result shows that the N concentration in the films slightly increase from 10% to 12% when N ion bombardment energy increases from 1000 Ev to 2200 Ev. The bombardment of energetic N ion induces the conversion of sp3 bond to sp2 bond. The CN bonds can be formed in the films after energetic N ion bombardment. Energetic N ion bombardment is implanted superficially. The RMS of the films decreases from 0. 2 to 0. 18 nm after the bombardment, and then increases again to 0. 33 nm with the increment of the N ion energy. The friction test indicates that the minimum of friction coefficient is about 0. 09 nm before ta-C film was bombarded by energetic N ion. The friction coefficient increased to about 0. 16 nm after the bombardment of N ions. But the friction coefficient does not depend on the N ion energy.

关键词

四面体非晶碳/X射线光电子能谱/摩擦系数

Key words

tetrahedral amorphous carbon/ x-ray photoelectron spectroscopy/ friction coefficient

引用本文复制引用

韩亮,陈仙,杨立,王炎武,王晓艳,赵玉清..高能氮离子轰击对四面体非晶碳膜的表面改性和摩擦系数影响的研究[J].物理学报,2011,60(6):584-588,5.

基金项目

陕西省"13115"科技创新工程重大科技专项(批准号:2009ZDKG-29)资助的课题. (批准号:2009ZDKG-29)

物理学报

OA北大核心CSCDCSTPCDSCI

1000-3290

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