强激光与粒子束2011，Vol.23Issue(6)：1659-1662,4.DOI:10.3788/HPLPB20112306.1659
磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力
Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si multilayers fabricated by magnetron sputtering
摘要
Abstract
A series of W, WSi2, Si thin films and W/Si, WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology. Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated. The results indicate that W thin films show relatively large compressive stress, while W/Si multilayers show tensile stress. Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress. WSi2/Si periodic multilayers have the most stable stress state with no sharp change, and is a good material combination for X-ray multilayer optics with a large number of bilayers.关键词
应力/形变/多层膜/磁控溅射/X射线Key words
stress/ deformation/ multilayer/ magnetron sputtering/ X-ray分类
数理科学引用本文复制引用
黄秋实,李浩川,朱京涛,王晓强,蒋励,王占山,唐永建..磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力[J].强激光与粒子束,2011,23(6):1659-1662,4.基金项目
国家自然科学基金项目(10773007,10704056) （10773007,10704056）
科技部国际交流与合作专项项目(2008DFA01920) （2008DFA01920）
