表面技术2011，Vol.40Issue(4)：34-37,54,5.
磁控溅射沉积非晶碳膜微结构及电学性能
Microstructure and Electrical Properties of Amorphous Carbon Films Deposited Using Magnetron Sputtering
尚魁平 1冶艳 2葛培林 1江利 2鲍明东2
作者信息
- 1. 中国矿业大学材料科学与工程学院,徐州221008
- 2. 宁波工程学院材料工程研究所,宁波315016
- 折叠
摘要
Abstract
Conductive amorphous carbon (a-C) film was deposited onto Si (100) substrate by closed field unbalanced magnetron sputtering. X-ray diffraction (XRD) results indicate a noticeable amorphous characteristic of the film. X-ray Photoelectron Spectrum (XPS) was used to investigate the binding structure of carbon. The sp2C fraction is about 59% according to the fitting of C1s peak locating between 284 eV and 285 eV, so sp2C is the dominate structure. The resistivity of the film is 1. 32×10-6Ω ? M, obtained by four probe method. Thus, it can be concluded that the film is graphite-like amorphous carbon film with dominate structure of sp2C.关键词
非晶碳膜/磁控溅射/微观结构/电阻率Key words
amorphous carbon film/ magnetron sputtering/ microstructure/ electricity分类
矿业与冶金引用本文复制引用
尚魁平,冶艳,葛培林,江利,鲍明东..磁控溅射沉积非晶碳膜微结构及电学性能[J].表面技术,2011,40(4):34-37,54,5.
