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高能质子源靶用氢化铒薄膜制备过程影响因素

付志兵 王朝阳 李朝阳 张厚琼 杨曦 许华

强激光与粒子束2011,Vol.23Issue(8):2090-2092,3.
强激光与粒子束2011,Vol.23Issue(8):2090-2092,3.DOI:10.3788/HPLPB20112308.2090

高能质子源靶用氢化铒薄膜制备过程影响因素

Factors influencing fabrication of erbium hydride films used as targets to generate high energy proton beams

付志兵 1王朝阳 1李朝阳 1张厚琼 1杨曦 1许华1

作者信息

  • 1. 中国工程物理研究院激光聚变研究中心,四川绵阳621900
  • 折叠

摘要

Abstract

Erbium hydride films were prepared via two steps. In the process, the erbium films fabricated via rolling reacted with hydrogen under high temperature and the hydrogenation process should last more than 24 hours for quality consideration. The hydrogen pressure and the reaction temperature play key roles in the fabrication process, and fine erbium hydride films can be obtained under proper control of the two factors when the hydrogenation process and the release of the stress generated in hydro genation are both slow. The derived fine erbium hydride films with thickness of 5 to 15 μm have been used as the targets in experi ments to produce high energy proton beams bringing good experimental results.

关键词

高能质子束/氢化铒薄膜/影响因素/反应温度/氢气压力

Key words

high energy proton beams/erbium hydride films/influencing factors/reaction temperature/hydrogen pressure

分类

化学化工

引用本文复制引用

付志兵,王朝阳,李朝阳,张厚琼,杨曦,许华..高能质子源靶用氢化铒薄膜制备过程影响因素[J].强激光与粒子束,2011,23(8):2090-2092,3.

基金项目

中国工程物理研究院科学技术发展基金项目(2009A0302020) (2009A0302020)

强激光与粒子束

OA北大核心CSCDCSTPCD

1001-4322

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