强激光与粒子束2011，Vol.23Issue(8)：2106-2110,5.DOI:10.3788/HPLPB20112308.2106
HfO2顶层多层介质膜脉宽压缩光栅的Piranha溶液清洗
Cleaning multilayer dielectric pulse compressor gratings with top layer of HfO2 by Piranha solution
摘要
Abstract
In order to improve the resistance of multilayer dielectric pulse compressor gratings (PCGs) with top layer of HfO2 to laser damage, the residues including carbon fluorinated compounds and metal compounds containing fluorine, which are left on the surface of PCG during ion reactive etching of HfO2 with working gas of CHF3, have been cleaned by Piranha solution (the mixture of 98% H2SO4 and 30% H2O2). The parameters of Piranha solution cleaning, such as cleaning temperature, com position, cleaning time, and times of cleaning, were studied systematically. Scanning electron microscope(SEM) was presented to observe the grooves of PCG and X-ray photoelectron spectroscopy(XPS) was employed to evaluate different elements on the sur face of PCG before and after cleaning. The removal mechanism of residual contaminants was analyzed. The experimental results show that higher removal efficiency can be achieved with more times of cleaning and higher cleaning temperature. In the cleaning active time of 60 minutes at the temperature of 90 ℃ , the atomic fraction of residual fluorine on the surface of PCG which were cleaned for three times or more was close to 0.1% (the resolution limitation of XPS), when the volume ratio of H2SO4 to H2O2 was 2 ∶1.关键词
多层介质膜脉宽压缩光栅/污染物/Piranha溶液/扫描电子显微镜/X射线光电子能谱Key words
multilayer dielectric pulse compressor gratings/contamination/Piranha solution/scanning electron microscope/X-ray photoelectron spectroscopy分类
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陈上碧,盛斌,邱克强,刘正坤,徐向东,刘颖,洪义麟,付绍军..HfO2顶层多层介质膜脉宽压缩光栅的Piranha溶液清洗[J].强激光与粒子束,2011,23(8):2106-2110,5.基金项目
国家高技术发展计划项目 （）
