人工晶体学报2011，Vol.40Issue(4)：921-925,5.
沉积温度对磁控溅射BiFeO3薄膜结构和性能的影响
Effect of Deposition Temperature on the Structural and Physical Properties of BiFeO3 Films Prepared by Magnetron Sputtering
摘要
Abstract
SrRu03(SR0)/BiFeO3(BFO)/SRO heterostructure capacitors were fabricated on Pt/TiO2/SiO2/Si (001) substrate using SRO as buffer layer, in which BFX) thin films was deposited by RF magnetron sputtering. The effect of deposition temperature on the structural and physical properties of BFX) thin film was investigated by X-ray diffraction(XRD) and a ferroelectric tester. X-ray diffraction (XRD) revealed that the BFX) thin films were polycrystalline. Under the test frequency of 2.5 kHz, the BFX) ferroelectric film deposited at 500 z℃. Presented agood saturated hysteresis loop, and the remnant polarization IP,, coercive field Ec and leakage current of the 500 ℃ grown BFX) film were 145 μC/cm2, 158 kV/cm, and 2.4 × 10-4 A/cm2, respectively. The leakage conduction mechanism of the SRO/BFO/SRO capacitor satisfied the ohmic conduction behavior at low applied fields and bulk-limited space-charge-limited conduction (SCLC) at the high applied fields. Moreover, it was found that BFX) capacitor possessed very good fatigue-resistance up to 109 cycles.关键词
磁控溅射/沉积温度/SrRuO3/BiFeO3薄膜Key words
magnetron sputtering/deposition temperature/SrRuO3/BiFeO3 film分类
数理科学引用本文复制引用
赵庆勋,张婷,马继奎,魏大勇,王宽冒,刘保亭..沉积温度对磁控溅射BiFeO3薄膜结构和性能的影响[J].人工晶体学报,2011,40(4):921-925,5.基金项目
国家自然科学基金(60876055,11074063) （60876055,11074063）
高等学校博士点基金(20091301110002) （20091301110002）
河北省自然科学基金(E2009000207,E2008000620,08B010) （E2009000207,E2008000620,08B010）
河北省应用基础研究计划重点基础研究项目(10963525D) （10963525D）
