红外技术2011，Vol.33Issue(9)：509-511,3.
非晶碳化硅薄膜的结构及其光学特性研究
The Structures and Optical Properties of Amorphous Silicon Carbide
宋超 1孔令德2
作者信息
- 1. 韩山师范学院,物理与电子工程系,潮州广东521041
- 2. 昆明物理研究所,昆明云南650223
- 折叠
摘要
Abstract
A series of hydrogenated amorphous silicon carbide thin films with different C/Si ratio were fabricated using plasma-enhanced chemical vapor deposition system by changing the ratio of methane and silane. The changes of microstructures were characterized by the Raman, X-ray photoeleetron spectroscopy (XPS) and Fourier-transform infrared (FT-IR) spectra. It was found that the optical band gap of the film becomes wider as the C-H bond and Si-C bond content increase, and it reaches as high as.2.4 eV when the ratio of methane and silane is 10.关键词
碳化硅/非晶薄膜/光学带隙Key words
silicon carbide film, amorphous thin film, optical band gap分类
数理科学引用本文复制引用
宋超,孔令德..非晶碳化硅薄膜的结构及其光学特性研究[J].红外技术,2011,33(9):509-511,3.
