表面技术2011，Vol.40Issue(6)：58-61,77,5.
SiO2/TiO2变折射率光学薄膜制造技术研究
Research the Deposition of SiO2/TiO2 Nonlinear Refractive-index Optical Thin Films
宁晓阳 1杭凌侠 2郭峰 1潘永强2
作者信息
- 1. 西安工业大学,西安710032
- 2. 陕西省薄膜技术与光学检测重点实验室,西安710032
- 折叠
摘要
Abstract
The feasibility of the SiO2/TiO2 nonlinear refractive-index films' deposition by single source electron beam mix evaporation was discussed. The mixture of which SiO2/TiO2 mixed 1 : 1 and 1 : 2, were evaporated onto BK7 glass, respec-tively. The changes of their refractive-indexes were analyzed by compared the experimental results of single source electron beam evaporation and double source electron beam evaporation. The process shows that the difference of evaporation between SiOz and TiO2 influences the deposition of SiO2/TiO2 films mostly, and there is not corresponding relations are found between the mixing ration of Si()2/TiO2 and their refractive-index.关键词
SiO2/TiO2薄膜/单源混蒸/电子束蒸发/变折射率Key words
SiO2/TiOz thin film/ single source mix evaporation/ electron beam evaporation/ nonlinear reflectivity index分类
矿业与冶金引用本文复制引用
宁晓阳,杭凌侠,郭峰,潘永强..SiO2/TiO2变折射率光学薄膜制造技术研究[J].表面技术,2011,40(6):58-61,77,5.
