表面技术2011，Vol.40Issue(6)：82-84,93,4.
工作气压对磁控溅射Mo膜的影响
Effects of Work Pressure on Mo Films Deposited by DC Magnetron Sputtering
摘要
Abstract
Mo films were fabricated at different sputtering pressure by DC magnetron sputtering. Deposition rate, surface topography and crystal structure of Mo films as the function of work pressure were studied. The results show that, in the pressure range of 0. 1 Pa～0. 5 Pa, the deposition rate has little changes, while in the pressurerange of 0. 5 Pa～1. 5 Pa, the deposition rate increases with increasing the sputtering pressure. The surface roughness of Mo films increase with increasing the sputtering pressure. All the Mo films are cubic structure. At lower sputtering pressure, the crystal of Mo film becomes good.关键词
直流磁控溅射/Mo薄膜/工作气压/沉积速率/表面形貌Key words
DC magnetron sputtering/ Mo films/ work pressure/ deposition rate/ surface topography分类
矿业与冶金引用本文复制引用
廖国,陈太红,曾体贤,谌家军,王冰,张玲,牛忠彩,张志娇,何智兵,杨晓峰,李俊,许华..工作气压对磁控溅射Mo膜的影响[J].表面技术,2011,40(6):82-84,93,4.基金项目
西华师范大学大学生科技创新基金项目(42710071) （42710071）
