传感技术学报2012，Vol.25Issue(1)：25-28,4.DOI:10.3969/j.issn.1004-1699.2012.01.005
硅基底和金刚石基底上沉积ZnO薄膜工艺研究
Technique Study on the Deposition of Zno Film on Silicon Substrate and Diamond Substrate
摘要
Abstract
Zinc oxide ( ZnO) film is deposited on Si (001) substrate and diamond substrate by radio-frequency ( RF ) reactive magnetron sputtering method. The effects of silicon substrate and diamond substrate on the structure of ZnO film are investigated. The effects of the ratio of Ar/O2 and annealing temperature are analyzed as well. Crystal structures of the films are charactered by X-ray diffraction (XRD) and atomic force microscopy ( AFM). The results indicate: (1) The surface morphology of the film on the diamond substrate is superior to silicon substrate; (2) On the same substrate,the crystalline orientation of ZnO film is in direct proportion to the Ar/O2 gas ratio; (3) As to silicon substrate, proper annealing temperature is helpful to improve the crystal orientation of ZnO film.关键词
声表面波滤波器/ZnO薄膜/金刚石/射频磁控溅射/氩氧比/退火温度Key words
SAW filter/ZnO film/diamond/RF reactive magnetron sputtering/the ratio of Ar/O2/annealing temperature分类
信息技术与安全科学引用本文复制引用
陈颖慧,高杨,席仕伟,赵兴海..硅基底和金刚石基底上沉积ZnO薄膜工艺研究[J].传感技术学报,2012,25(1):25-28,4.基金项目
中国工程物理研究院科技发展基金重点课题(2008A0403016,2010A0302013) （2008A0403016,2010A0302013）
