发光学报Issue(1)：82-87,6.DOI:10.3788/fgxb20123301.0082
预通三甲基铝对AlN薄膜的结构与应变的影响
Effect of Trimethyl-aluminum Preflow on The Structure and Strain Properties of AlN Films
摘要
Abstract
We studied the effects of trimethyl-aluminum(TMAl)preflow on the properties of AlN films grown on (0001)sapphire substrates via metalorganic chemical vapor deposition using high-temperature treatments.Short TMAl preflow treatments had little effect on the surface morphology of the AlN films,but hexagonal islands appeared on the surface when the TMAl preflow time increased.As the preflow time increased,the crystalline quality decreased and the stress state of the AlN films also changed.The origin of this stress behavior can be explained through a combination of extrinsic stress and intrinsic stress.关键词
金属有机物气相沉积/AlN/预通三甲基铝(TMAl)/应力Key words
metalorganic chemical vapor deposition/AlN/TMAl preflow/stress分类
数理科学引用本文复制引用
贾辉,陈一仁,孙晓娟,黎大兵,宋航,蒋红,缪国庆,李志明..预通三甲基铝对AlN薄膜的结构与应变的影响[J].发光学报,2012,(1):82-87,6.基金项目
国家基础研究发展计划(2011CB301901) （2011CB301901）
国家自然科学基金(51072196,51072195) （51072196,51072195）
国家"863"计划(2011AA03A111)资助项目 （2011AA03A111）
