发光学报2012，Vol.33Issue(2)：227-232,6.DOI:10.3788/fgxb20123302.0227
直流反应磁控溅射在氮化的蓝宝石衬底上制备AlN薄膜
Deposition of AIN Films on Nitrided Sapphire Substrates by Reactive DC Magnetron Sputtering
摘要
Abstract
Aluminum nitride (AIN) films were prepared successfully on sapphire and nitrided sapphire substrates by reactive DC magnetron sputtering.The effect of nitridation of sapphire substrate on the growth of AIN films was studied.The films were characterized by X-ray diffraction (XRD),atomic force microscopy (AFM) and optical absorption spectrum.XRD patterns of AIN films exhibited a strong preferential c-axis orientation,and nitridation of sapphire substrate could improve the crystal quality of AIN films and also decrease the residual stress of films.But AFM results revealed that the grain size distribution of films deposited on nitrided sapphire substrates was not more homogenous than that of films deposited on sapphire substrates,and optical absorption results also showed nitridation of sapphire substrate nearly had no effect on the optical behavior of AIN films.关键词
晶体结构/光吸收/表面形貌Key words
crystal structure/ optical absorption/ surface morphology分类
数理科学引用本文复制引用
王新建,宋航,黎大兵,蒋红,李志明,缪国庆,孙晓娟,陈一仁,贾辉..直流反应磁控溅射在氮化的蓝宝石衬底上制备AlN薄膜[J].发光学报,2012,33(2):227-232,6.基金项目
国家自然科学基金(51072196,51072195)资助项目 （51072196,51072195）
