高压物理学报2012，Vol.26Issue(1)：107-112,6.
1064nm激光对氧化铟锡薄膜的损伤研究
1 064 nm Laser Damage on Indium Tin Oxide Films
李阳龙 1王伟平 1骆永全 1王海峰 1张大勇1
作者信息
- 1. 中国工程物理研究院流体物理研究所,四川绵阳621900
- 折叠
摘要
Abstract
Liquid crystal optical elements have important applications in laser facility, and the indium tin oxide （ITO） films are generally used in liquid crystal optical elements as transparent conductive electrodes. Laser induced damage of ITO films leads to failure of liquid crystal optical elements. The laser damage model of ITO films which simulates the temperature distribution and thermal stress distribution was established. The laser damage of ITO films was experimented through pump-probe technology,and the power density producing damage at a probability of 50 % （i. e. ,damage threshold） was obtained by 1-on-1 testing,and the square resistance of the film after laser irradiation was also measured. The experimental data basically agree with the simulated results. The results show that 1 064 nm laser damage of ITO film occurs mainly by thermal stress. The damage of ITO film begins from K9 glass substrate after CW laser irradiation,while the damage begins from the surface of ITO film after pulsed laser irradiation. Furthermore, the laser damage thresholds decrease with the increase of thickness of ITO films. The square resistance of ITO films increases with the increase of laser intensity unless the ITO films have been damaged completely. The optimal thickness of ITO film in liquid crystal optical element depends on the factors of laser damage, transparence and square resistance.关键词
激光辐照/液晶光学器件/损伤阈值/氧化铟锡薄膜Key words
laser irradiation/liquid crystal optical elements/damage threshold/indium tin oxide film分类
数理科学引用本文复制引用
李阳龙,王伟平,骆永全,王海峰,张大勇..1064nm激光对氧化铟锡薄膜的损伤研究[J].高压物理学报,2012,26(1):107-112,6.
