航空材料学报2011，Vol.31Issue(6)：36-42,7.DOI:10.3969/j.issn.1005-5053.2011.6.007
冷态输送ZrCl4低压化学气相沉积ZrC涂层的制备
Preparation of ZrC Film by Transporting Solid ZrCl4 during Low Pressure Chemical Vapor Deposition
摘要
Abstract
ZrC film was deposited by chemical vapor deposition( CVD) with ZrCl4-CH4-Ar system, and ZrCl4 was transported in solid. The characters of the ZrC film were analyzed by chemical thermodynamics calculating and experimenting. The composition, surface morphology and microstructure were studied by X-ray diffractometry and scanning electron microscopy. The results show that this way falls down the chemical vapor deposition temperature. And it is easy to get widespread homogeneous ZrC film in structure. The film surface is formed by grains within the size of 20 -80nm, and shows anomalous "farmland" organization. The film structure is mainly for columnar crystal which grows preferentially in the plane(200). In addition, the formation mechanism of the "farmland" organization and the growth mechanism of the ZrC film were analyzed.关键词
ZrC涂层/CVD/冷态输送ZrCl4/表面形貌/组织结构/生长机理Key words
ZrC film/ CVD/ the transportation of the solid ZrCl4 / surface morphology/ structure/ mechanism分类
通用工业技术引用本文复制引用
刘岗,李国栋,熊翔,王雅雷,陈招科,孙威..冷态输送ZrCl4低压化学气相沉积ZrC涂层的制备[J].航空材料学报,2011,31(6):36-42,7.基金项目
国家高技术研究发展计划(2007AA03Z110) （2007AA03Z110）
国家自然科学基金创新研究群体项目(50721003) （50721003）
国家重点基础研究发展计划(2011CB605805) （2011CB605805）
