金刚石与磨料磨具工程2011，Vol.31Issue(5)：35-38,4.DOI:10.3969/j.issn.1006-852X.2011.05.008
氮化铝基片的集群磁流变抛光加工
Polishing AIN substrate by cluster magnetorheological effect
摘要
Abstract
The polishing of A1N substrate by cluster magnetorheological(MR) effect technology is researched, and the influence of the preliminary experimental parameters and the feature of machined surface morphology are studied. Experimental result demonstrates that cluster MR-effect plane polishing A1N substrate is feasible and it can achieve ultra smooth polishing with high efficiency, after 60 minutes polishing the original surface roughness was decreased from Rs 1.730 2 μm to Ra 0.037 8 μm. Smoother machined surface and higher material removal were obtained when we selected appropriate machining parameters including SiC abrasive ( mass concentration 0. 05g/mL) , the speed ratio between workpiece and polishing disc about 5. 8, smaller machining gap during the initial polishing and larger machining gap during the final polishing.关键词
氮化铝基片/集群磁流变效应/抛光/表面粗糙度Key words
AIN substrate/ cluster magnetorheological effect/ polishing/surface roughness分类
矿业与冶金引用本文复制引用
白振伟,阎秋生,路家斌,潘继生,祝江停..氮化铝基片的集群磁流变抛光加工[J].金刚石与磨料磨具工程,2011,31(5):35-38,4.基金项目
国家自然科学基金(No.50875050) （No.50875050）
NSFC-广东联合基金(U1034006)和广东省自然科学基金(No.9251009001000009)资助. （U1034006）
