理化检验：物理分册2011，Vol.47Issue(12)：763-766,4.
氧氩比对磁控溅射ZnO薄膜结构及光致发光性能的影响
Effects of O_2/Ar Ratios on the Structure and Photoluminescence of ZnO Thin Films Prepared by Magnetron Sputtering
摘要
Abstract
ZnO thin films were deposited on glass substrates by the reactive radio-frequency magnetron sputtering with different O2/Ar ratios.The phase compositions and morphology of the ZnO thin films were analyzed by XRD and AFM.The room-temperature photoluminescence（PL） of ZnO films were measured by fluorescence photometer.The results show that when the O2/Ar ratio was 7∶5,the prepared ZnO thin film had the best crystallization quality with fine and homogeneous grain structure.The violet,blue and green peaks were observed on the PL spectra.With the increase of O2/Ar ratio,the blue emission was enhanced,while the violet and green emission was increased first and then decrease,and when the O2/Ar ratio was 7∶5,the violet and green emission intensity was the strongest.关键词
ZnO薄膜/射频反应磁控溅射/光致发光Key words
ZnO thin film/reactive radio-frequency magnetron sputtering/photoluminescence分类
通用工业技术引用本文复制引用
刘丹,李合琴,刘涛,武大伟..氧氩比对磁控溅射ZnO薄膜结构及光致发光性能的影响[J].理化检验：物理分册,2011,47(12):763-766,4.基金项目
国家“973”计划资助项目 （）
安徽省自然科学基金资助项目 （）
安徽省高校自然科学基金资助项目 （）
