人工晶体学报2011,Vol.40Issue(5):1316-1321,6.
WO3薄膜的电致变色与响应时间机理研究
Response Time and Electrochromic Mechanism of WO3 Films
摘要
Abstract
Nanoscaled tungsten oxide films were fabricated by reactive DC magnetron sputtering. The influence of deposition gas pressure on surface morphology and microstructure of tungsten oxides was studied. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were utilized to characterize the micro-structural of the prepared thin films. Electrochromic and response time properties were researched by simultaneous spectrophotometric and cyclic voltametric measurements of tungsten oxides. The investigation results showed that micro-porous nanostructure has strong effects on the electrochemical and chromogenic properties, which depending on the specific surface area. For deposition gas pressure being 4 Pa, the modulating range of the visible optical transmittance can reach 71. 6% , the colored response time is 5 s, and the bleached response time is 16 s.关键词
WO3薄膜/磁控溅射/电致变色/响应时间Key words
WO3 thin films/ magnetron sputtering/ electrochromism/ response time分类
数理科学引用本文复制引用
杨海刚,宋桂林,张基东,王天兴,常方高..WO3薄膜的电致变色与响应时间机理研究[J].人工晶体学报,2011,40(5):1316-1321,6.基金项目
河南省重点科技攻关计划项目(102102210184) (102102210184)
河南省教育厅自然科学研究项目(2010B140008) (2010B140008)