山东建筑大学学报2011，Vol.26Issue(5)：425-428,446,5.
Er/Yb/Al掺杂ZnO薄膜的结构与形貌研究
Study on the structure and morphology of Er/Yb/Al-doped ZnO thin film
摘要
Abstract
ZnO thin films and Er/Yb/Al-doped ZnO thin films on Si substrate were fabricated by using RF magnetron sputtering method at room temperature. The XRD structure analysis shows that undoped ZnO thin film grows along the C orientation, but doped ZnO thin films deviate from the normal growth orientation and become nano-multi-crystal structure which is along (102) orientation and the crystal-lite size of ZnO thin film doped the Er/Yb /Al decreases with the increase of the content of the Er ele-ment. The morphology by AFM analysis shows that Er3 + 、Yb3 +、Al3+ that is doped in the ZnO thin films cause a change of crystal field and make the surface roughness larger.关键词
射频磁控溅射/ZnO薄膜/掺杂/结构/形貌Key words
RF magnetron sputtering/ ZnO thin film/ doping/ structure/ morphology分类
数理科学引用本文复制引用
韩利新,张宁玉,霍庆松,宋红莲..Er/Yb/Al掺杂ZnO薄膜的结构与形貌研究[J].山东建筑大学学报,2011,26(5):425-428,446,5.基金项目
住房和城乡建设部研究开发项目(2010-K4-15) （2010-K4-15）
山东建筑大学博士基金(010180921) （010180921）
