无机材料学报2011，Vol.26Issue(11)：1227-1232,6.DOI:10.3724/SP.J.1077.2011.11299
氧等离子体辅助脉冲激光沉积法制备PMN-PT薄膜的微观结构和电学性能
Microstructure and Electrical Properties of PMN-PT Thin Films Prepared by Oxygen Plasma Assisted Pulsed Laser Deposition
摘要
Abstract
Lead magnesium niobate-lead titanate (PMN-PT) ferroelectric thin films with composition near the morphotropic phase boundary (MPB) were deposited on Si substrate by oxygen plasma assisted pulsed laser deposition (PLD).Highly (001)-oriented PMN-PT thin films with lower oxygen defect and higher crystalline property were obtained.The results show that the microstructure and electrical properties of PMN-PT thin films strongly depend on the partial pressure and the activity of oxygen in the deposition process.With the use of oxygen plasma,the dielectric constant of the PMN-PT thin film is increased from 1484 to 3012,the remnant polarization (2Pr) changes from 18μC/cm2 to 38 μC/cm2.关键词
脉冲激光沉积法/PMN-PT薄膜/微观结构/电学性能Key words
pulse laser deposition/PMN-PT thin films/microstructure/electrical properties分类
化学化工引用本文复制引用
何邕,李效民,高相东,冷雪,王炜..氧等离子体辅助脉冲激光沉积法制备PMN-PT薄膜的微观结构和电学性能[J].无机材料学报,2011,26(11):1227-1232,6.基金项目
National Basic Research ProgramofChina(973Program)(2009CB623304) （973Program）
National Natural Science Foundation of China (11090332) （11090332）
