无机材料学报2011，Vol.25Issue(12)：1281-1286,6.DOI:10.3724/SP.J.1077.2011.01281
射频磁控溅射制备HfLaO薄膜结构和光学性能研究
Structural and Optical Properties of HfLaO Films Prepared by RF Magnetron Sputtering
摘要
Abstract
HfLaO films doped with different La contents, varying from 17% to 37%, were deposited using RF magnetron sputtering. The structure, thermal stability, surface morphology, and optical properties of HfLaO films were investigated by X-ray diffraction (XRD), atomic force microscope (AFM) and spectrophotometry. The results indicate that as-deposited HfLaO with 25%-37% La films are amorphous. With the increase of La contents, the crystallization temperature for HfLaO films is increased. The HfLaO film with 37% La remains amorphous even after annealed at 900 °C. The AFM images show amorphous HfLaO films, which imply a good thermal stability have a relatively smooth surface. The average transmittance in the visible range is above 82% for all the films. The amorphous structure yields films of significantly higher transparency than the polycrystalline structure does. The refractive indices of the films are determined to be in the range 1.77-1.87. As the La concent increases the refractive indices of the films are initially increased and then decreased. The optical band gap of the HfLaO films decreases to 5.9eV (La 17%), 5.87eV(La 25%), 5.8eV(La 33%), 5.77eV(La 37%), respectively.关键词
HfLaO薄膜/磁控溅射/热学稳定性/光学性能Key words
HfLaO films, magnetron sputtering, thermal stability, optical properties分类
数理科学引用本文复制引用
李智,苗春雨,马春雨,张庆瑜..射频磁控溅射制备HfLaO薄膜结构和光学性能研究[J].无机材料学报,2011,25(12):1281-1286,6.基金项目
辽宁省教育厅高校科研计划项目(2008049) （2008049）
国家自然科学基金(10605009,10774018) （10605009,10774018）
中央高校基本科研业务专项基金(DUT11LK44) （DUT11LK44）
