湖南工业大学学报2011，Vol.25Issue(5)：22-25,28,5.
退火温度对Al掺杂ZnO薄膜结构和性能的影响
Effects of Annealing Temperature on the Structure and Properties of Al Doped ZnO Thin Films
摘要
Abstract
The ZnO：Al（ZAO） films were deposited on glass substrates by using a DC reactive magnetron sputtering system.With the other parameters unchanged,the structural,electrical and optical properties of ZAO films were studied at the different annealing temperatures.The experimental results show that at the annealing temperature of 200 ℃ the ZAO thin film has better optical properties,the resistivity is 9.62×10-5 Ω·cm and the transmissivity in visible region is 89.2%.关键词
ZAO薄膜/退火温度/电学性能/光学性能Key words
ZAO films/annealing temperature/electrical properties/optical properties分类
数理科学引用本文复制引用
李雪勇,崔丽玲,严钦云..退火温度对Al掺杂ZnO薄膜结构和性能的影响[J].湖南工业大学学报,2011,25(5):22-25,28,5.基金项目
湖南省教育厅科研基金资助项目 （）
