强激光与粒子束2011，Vol.23Issue(12)：3157-3162,6.DOI:10.3788/HPLPB20112312.3157
多光束激光干涉光刻图样
Multi-beam laser interference lithography pattern
摘要
Abstract
The principle of multi-beam laser interference lithography patterns was studied according to the electromagnetic theory. The factors affecting the patterns were analyzed by comparing numerical simulations with experimental results. It is found that multi-beam laser interference patterns can be considered as superpositions of multiple parallel stripes which are cosine distrib-uted. The beams' polarization direction, incident direction and phase difference are important factors influencing the patterns, which affect the parallel stripes' amplitude, location, period and orientation severely.关键词
微纳结构/纳米制造/激光干涉光刻/激光干涉图样Key words
micro-nano structures/nanofabrication/ laser interference lithography/laser interference patterns/分类
信息技术与安全科学引用本文复制引用
张伟,刘维萍,顾小勇,谈春雷,彭长四..多光束激光干涉光刻图样[J].强激光与粒子束,2011,23(12):3157-3162,6.基金项目
国家自然科学基金项目(11074181) （11074181）
江苏省高校优势学科建设工程资助项目 （）
中国科学院SAFEA创新研究国际合作团队及欧盟第七研究框架LaserNaMi项目(247644) （247644）
