无机材料学报2012，Vol.27Issue(1)：64-68,5.DOI:10.3724/SP.J.1077.2012.00064
基底温度对直流溅射Nb掺杂TiO2薄膜性能的影响
Influence of the Substrate Temperature on the Properties of Nb-doped TiO2 Films Deposited by DC Magnetron Sputtering
摘要
Abstract
Nb-doped (2.5wt%) TiO2 thin films was deposited on glass substrate by DC magnetron sputtering from a ceramic target and the films thickness was controlled in the range from 300 nm to 350 nm. The structure, surface morphology and optical properties of the films deposited at different substrate temperatures were investigated by X-ray diffraction, scanning electron microscope, and optical transmission spectroscope. The films deposited at 150℃, 250℃ and 350°C were amorphous, anatase and rutile, respectively. The grain size of the typical anatase film deposited at 250℃ reached the maximum of 32 nm. The roughness of the films decreased and their density increased with the rising of substrate temperature. The average optical transmittance of films were around 70% when the substrate temperatures were below 250℃. As the substrate temperature were risen to 350℃, the films' transmittance dropped to 59%. It indicated that the transmittance of visible light was hindered by the rutile phase in the Nd-doped TiO2 films. The optical band gap of the films were in the range from 3.68 eV to 3.78 eV, and the optical band gap of the typical anatase film deposited at 250℃ reached the highest value of 3.78 eV.关键词
基底温度/TiO2/直流磁控溅射/陶瓷靶/显微结构/光学特性Key words
substrate temperature/ TiO2/ DC magnetron sputtering/ ceramic target/ structure/ optical properties分类
化学化工引用本文复制引用
黄帅,李晨辉,孙宜华,柯文明..基底温度对直流溅射Nb掺杂TiO2薄膜性能的影响[J].无机材料学报,2012,27(1):64-68,5.基金项目
国家自然科学基金(50074017) （50074017）
