物理化学学报2012，Vol.28Issue(2)：381-386,6.DOI:10.3866/PKU.WHXB201112123
直流反应磁控溅射制备的Mo掺杂TiO2薄膜的光电特性
Photoelectric Properties of Mo Doped TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering
摘要
Abstract
Nanocrystalline TiO? Thin films doped with different concentrations of Mo were deposited by direct current (DC) reactive magnetron sputtering. The influence of Mo on surfaces, crystal structures, the valence states of elements and the absorption band of Mo doped TiO2 films were characterized by means of atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and Ultraviolet-visible spectroscopy (UV-Vis). To investigate the photoelectric characteristic of ITO (indium tin oxide)/Mo-TiO2 electrodes, a series of cyclic voltammetry experiments were conducted. The results indicate that an appropriate amount of Mo atoms, observed as Mo6* and Mo5* by XPS, could inhibit the crystal growth of particles, enhance the surface roughness of the Mo doped TiO2 thin film, and bring about a remarkable red shift of the absorption spectra. As the concentration of Mo increased, the energy gap declined at first until the amount of doped Mo eventually reached 3.6% (n(Mo)/n(Ti)), when a blue shift of spectra resulted and the energy gap grew wider. The sample doped with 0.9% Mo was irradiated with a Xe lamp and showed the highest photocurrent, which continued to increase with increasing voltage exerted on the anode. An increase in Mo concentration resulted in a decrease in photocurrent. Compared to the pure TiO2 film, the sample with 3.6% Mo had a much lower photocurrent. Our experiments demonstrate that Mo doping, when the concentration was controlled under a relatively low limit, brought about a significant improvement of the photoelectric properties of the TiO3 films. The highest photocurrent observed is 2.4 times that of the sample with no Mo doping.关键词
光生电流/循环伏安/直流反应磁控溅射/二氧化钛薄膜/钼掺杂Key words
Photocurrent/Cyclic voltammetry/ DC reactive magnetron sputtering/ Titanium dioxide thin film/Mo doping分类
化学化工引用本文复制引用
颜秉熙,罗胜耘,沈杰..直流反应磁控溅射制备的Mo掺杂TiO2薄膜的光电特性[J].物理化学学报,2012,28(2):381-386,6.基金项目
国家重点基础研究发展规划项目 (973) (2010CB933703,2012CB934303)资助 （973）
