现代电子技术2012，Vol.35Issue(3)：202-203,206,3.
ALD中射频阻抗匹配器的设计与研究
Design and research of RF impedance matching device in ALD
摘要
Abstract
The design of RF impedance matching device in the atomic layer deposition (ALD) system is described. The impedance matching network was simulated with ADS. Through analyzing the load impedance characteristic before and after the plasma generating in the vacuum chamber, and combining with the simulation results, the control method of impedance matching network when the plasma produce is proposed. The experiment proves that impedance matching can be realized by this impedance matching device and the control method.关键词
射频阻抗匹配器/阻抗匹配网络/ALD/ADSKey words
RF impedance matching device/ impedance matching network/ ALD/ ADS分类
信息技术与安全科学引用本文复制引用
孙小孟,李勇滔,夏洋,李超波,李英杰,陈盛云,赵章琰,秦威..ALD中射频阻抗匹配器的设计与研究[J].现代电子技术,2012,35(3):202-203,206,3.基金项目
国家科技重大专项(2009ZX02037) （2009ZX02037）
