真空电子技术Issue(6)：29-33,5.
新型薄膜钪系阴极性能研究
Study of Novel Coating Sc-Type Cathode
王舒墨 1李季 1王辉1
作者信息
- 1. 北京真空电子技术研究所,北京100015
- 折叠
摘要
Abstract
In this paper, a simple method will be introduced to manufacture coating Sc-type cathode which use Triode DC sputtering to deposit a Sc-containing film with Sc6 WO12 +W target. We study the e-mission property and work function of this cathode and analyze characteristic of the emission surface. Current density of 86 A/cm2 at cathode temperature of 1000 ℃ is reached which shows excellent emission capability.关键词
薄膜钪系阴极/直流溅射Key words
Sc-type coated cathode/ DC sputtering分类
数理科学引用本文复制引用
王舒墨,李季,王辉..新型薄膜钪系阴极性能研究[J].真空电子技术,2011,(6):29-33,5.
