| 注册
首页|期刊导航|电子科技大学学报|亚表面杂质对熔石英激光损伤的影响

亚表面杂质对熔石英激光损伤的影响

蒋晓东 郑直 祖小涛 李春宏 周信达 黄进 郑万国

电子科技大学学报2012,Vol.41Issue(2):238-241,304,5.
电子科技大学学报2012,Vol.41Issue(2):238-241,304,5.DOI:10.3969/j.issn.1001-0548.2012.02.013

亚表面杂质对熔石英激光损伤的影响

Distribution of Inclusions in Fused Silica Sub-Surface and Its Influence on Laser-Induced Damage

蒋晓东 1郑直 1祖小涛 2李春宏 2周信达 1黄进 3郑万国1

作者信息

  • 1. 中国工程物理研究院激光聚变研究中心,四川绵阳621900
  • 2. 电子科技大学物理电子学院,成都610054
  • 3. 北京科技大学物理系,北京海淀区100083
  • 折叠

摘要

Abstract

Fused silica with different etching time were obtained by HF acid etching. The variation and distribution of inclusions were analyzed by synchrotron X-ray fluorescence spectrometry. The relative concentrations of main inclusions, such as Fe, Cu and Ce, are decreased with the increase of etching time. The AFM and Wyko images of the samples show that the surface roughness increase with the increase of etching time. The R:l test procedure has been adapted to the pre-etching samples. The laser induced damage threshold (LIDT) increases within 30 min etching time and rapidly decreases to the threshold of non-etching fused silica level. The result indicates that Cu, Ce concentrations plays important role at low etching time, whereas when etching time is too long, the decreased LIDT is attributed to the increment of surface roughness.

关键词

熔石英/HF酸刻蚀/激光损伤/X射线荧光成像方法

Key words

fused silica/ HF acid etching/ laser induced damage/ SXRF

分类

数理科学

引用本文复制引用

蒋晓东,郑直,祖小涛,李春宏,周信达,黄进,郑万国..亚表面杂质对熔石英激光损伤的影响[J].电子科技大学学报,2012,41(2):238-241,304,5.

基金项目

国家自然科学基金(61178018) (61178018)

电子科技大学学报

OA北大核心CSCDCSTPCD

1001-0548

访问量0
|
下载量0
段落导航相关论文