化工进展2012，Vol.31Issue(3)：489-494,501,7.
超临界抗溶剂制粒装置的现状及其展望
Present status and prospect of granulation device by using supercritical anti-solvent
巫先坤 1王志祥 1黄德春 1蔡锦源 1颜庭轩1
作者信息
- 1. 中国药科大学药学院,江苏南京210009
- 折叠
摘要
Abstract
As a new micro-particle granulation technology,supercritical anti-solvent has been widely used in many fields.The fundamental principles,apparatus compositions and operation modes of supercritical anti-solvent technology were introduced briefly.The development and optimization process of granulation device of gas anti-solvent（GAS）,aerosol solvent extraction system（ASES）,solution enhanced dispersion by supercritical fluids（SDES）and supercritical fluid anti-solvent-atomization（SAA）were analyzed from the evolution of the nozzle components of this apparatus.Meanwhile,the prospect in device developing,such as multi-function of the device,further optimization of the nozzle and the crystallization vessel visualization were addressed.关键词
超临界抗溶剂法/GAS制粒装置/ASES制粒装置/SEDS制粒装置/SAA制粒装置Key words
supercritical anti-solvent/granulation device of GAS/granulation device of ASES/granulation device of SDES/granulation device of SAA分类
化学化工引用本文复制引用
巫先坤,王志祥,黄德春,蔡锦源,颜庭轩..超临界抗溶剂制粒装置的现状及其展望[J].化工进展,2012,31(3):489-494,501,7.
