强激光与粒子束2012，Vol.24Issue(6)：1276-1280,5.DOI:10.3788/HPLPB20122406.1276
SiO2/HfO2高反射膜的研制
Preparation of SiO2/HfO2 high reflectors
摘要
Abstract
The paper mainly discusses how to control the surface flatness and to improve the laser induced damage threshold (LIDT) of electron-beam evaporated SiOz/HfOz high reflectors. The deposition parameters were optimized to control the film stress and wavefront distortion, and to reduce the film absorption, to decrease the defect density. The LIDT of the prepared films was also measured. The experimental results show that adjusting the pressure during SiO2 evaporation can control the film stress within the range of -250 to -50 MPa. Using hafnium and silica as starting materials can reduce the defect density from 12. 6 to 2. 7 mm-2 and increase the LIDT from 30 to 55 J/cm2.关键词
应力/面形/吸收/节瘤缺陷/预处理/激光损伤Key words
stress/surface flatness/absorption/nodular defects/laser conditioning/laser induced damage分类
信息技术与安全科学引用本文复制引用
程鑫彬,沈正祥,焦宏飞,马彬,张锦龙,丁涛,王占山..SiO2/HfO2高反射膜的研制[J].强激光与粒子束,2012,24(6):1276-1280,5.基金项目
国家自然科学基金项目(61008030) （61008030）
教育部博士点基金项目(20100072120037) （20100072120037）
上海市晨光计划项目(10CG19) （10CG19）
