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磁控溅射制备Cu2O和Cu2O/TiO2复合膜及其光催化活性

刘灿 魏子栋 张骞 胡宝山 齐学强 陈四国 丁炜

无机材料学报2012,Vol.27Issue(4):395-399,5.
无机材料学报2012,Vol.27Issue(4):395-399,5.DOI:10.3724/SP.J.1077.2012.00395

磁控溅射制备Cu2O和Cu2O/TiO2复合膜及其光催化活性

Photocatalytic Activity of Cu2O and Bilayer Cu2O/TiO2 Films Prepared by Magnetron Sputtering

刘灿 1魏子栋 1张骞 1胡宝山 1齐学强 1陈四国 1丁炜1

作者信息

  • 1. 重庆大学输配电装备及系统安全与新技术国家重点实验室,化学化工学院,重庆400044
  • 折叠

摘要

Abstract

Cu2O, TiO2 and composite Cu2O/TiO2 films were deposited on slide glass by direct current (DC) reac-tive magnetron sputtering. X-ray diffraction (XRD), scanning electron microscope (SEM) and energy-dispersive spectrometry (EDS) were applied to characterize crystal structure, morphology and composition of the films, re-spectively. Photocatalytic activity was evaluated by the degradation of methylene blue (MB) with Xenon lamp. XRD results show that besides the initial (111) crystal plane at sputtering time of 5 min, (110) and (220) crystal planes gradually develop on the Cu2O film with the increase of sputtering time. Our calculation result indicates that (111) crystal plane is more beneficial to absorption of O2 than other crystal planes. The photocatalytic activity of the Cu2O/TiO2 composite films first increases with increasing Cu2O-deposited content, and then reaches the highest value when the deposited content of Cu2O is 2.6mol%, and successively undergoes a drop. The enhancement of the photocatalytic activity is mainly attributed to alleviate the recombination of electron-hole pairs. Excessive Cu2O will prolong the time for transferring of electrons to Cu2O/TiO2 interface and holes to surface, which increases the recombination probability of electrons and holes, and thus reduces the quantum efficiency.

关键词

磁控溅射/氧化亚铜/复合薄膜/光催化

Key words

magnetron sputtering/ cuprous oxide/ composite films/ photocatalytic

分类

化学化工

引用本文复制引用

刘灿,魏子栋,张骞,胡宝山,齐学强,陈四国,丁炜..磁控溅射制备Cu2O和Cu2O/TiO2复合膜及其光催化活性[J].无机材料学报,2012,27(4):395-399,5.

基金项目

国家自然科学基金(20806096) (20806096)

国家重点实验室项目(2007DA10512711211) (2007DA10512711211)

中央高校基本科研业务费专项基金(CDJXS10221141和11132229) (CDJXS10221141和11132229)

无机材料学报

OA北大核心CSCDCSTPCDSCI

1000-324X

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