物理学报2012，Vol.61Issue(5)：361-365,5.
射频磁控反应溅射制备的Ag_2O薄膜的椭圆偏振光谱研究
Spectroscopic ellipsometry study of the Ag2O film deposited by radio-frequency reactive magnetron sputtering
摘要
Abstract
Ag2O film has a potential application in high-density optical and magneto-optical disks. In this paper, a series of Ag2O films is deposited by radio-frequency reactive magnetron sputtering at different substrate temperatures, a deposition pressure of 0.2 Pa and an oxygen flow ratio of 2：3. The spectroscopic ellipsometry spectra of the films are fitted by using a general oscillator model （including one Tanc-Lorentz oscillator and two Lorentz oscillators）. In an energy range between 1.5 eV and 3.5 eV, the refractive index and extinctive coefficient of the film are in ranges between 2.2 and 2.7, and between 0.3 and 0.9, respectively. The film indicates a clear abnormal dispersion in an energy range of 3.5 eV and 4.5 eV, meaning that the plasma oscillator frequency of the film is in this energy range. A redshift of the absorption edge of the film occurs with substrate temperature increasing, which can be attributed to the increased lattice strain. The optical constants of the film clearly show the dielectric properties.关键词
Ag_2O薄膜/椭圆偏振/射频磁控反应溅射/光学性质Key words
Ag20 film/spectroscopic ellipsometry/radio-frequency reactive magnetron sputtering/optical properties分类
数理科学引用本文复制引用
马姣民,梁艳,郜小勇,陈超,赵孟珂,卢景霄..射频磁控反应溅射制备的Ag_2O薄膜的椭圆偏振光谱研究[J].物理学报,2012,61(5):361-365,5.基金项目
国家自然科学基金（批准号：60807001）、河南省高等学校青年骨干教师资助计划、国家重点基础研究发展计划（批准号：2011CB201605）和河南省教育厅自然科学资助研究计划（批准号：2010A140017）资助的课题. （）
