物理学报2012，Vol.61Issue(10)：178-183,6.
基于多层膜结构的亚波长光栅研究
Research of subwavelength grating based on multilayer films structure
摘要
Abstract
Abstract Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.关键词
表面等离子体/超分辨成像/纳米光刻技术Key words
suface plasmon/super-resolution imaging/nanolithography technique分类
信息技术与安全科学引用本文复制引用
梁高峰,赵青,陈欣,王长涛,赵泽宇,罗先刚..基于多层膜结构的亚波长光栅研究[J].物理学报,2012,61(10):178-183,6.基金项目
国家重点基础研究发展计划（973计划）（批准号：2011CB301800-G）、国际合作项目（批准号：2011DFA63190）和微细加工光学技术国家重点实验室基金（批准号：201101445）资助的课题. （）
