中山大学学报（自然科学版）2012，Vol.51Issue(3)：60-62,3.
化学溶液沉积法制备铁掺杂镍酸镧薄膜的结构及电学性能研究
Structural and Electrical Properties of Fe-doped LaNiO3Thin Film by Sol-gel Method
摘要
Abstract
La1-xFexNiO3(LNFeO-x) thin films were prepared on (100) Si substrates by a chemical solution deposition method ( CSD). Their structure and room temperature resitivity were analyzed. X-ray diffraction show that the thin films annealed at 700℃ for 1 h were grown in perovskite structure and no secondary phase was detected. The thin films were smooth, density and crack-free. The room temperature resistivity increases from 1. 7Ω ·cm to 3. 9 Ω·cm as x increases from 0 to 0. 15.关键词
LaNi1-xFexO3/LNFeO-x/化学溶液沉积法/CSDKey words
La1-xFexNiO3/ LNFeO-x/ chemical solution deposition method/ CSD分类
数理科学引用本文复制引用
陈如麒,翁嘉文,劳媚媚,徐军,朱贵文..化学溶液沉积法制备铁掺杂镍酸镧薄膜的结构及电学性能研究[J].中山大学学报（自然科学版）,2012,51(3):60-62,3.基金项目
广东省高校优秀青年创新人才培育资助项目(LYM10036) （LYM10036）
