衬底温度和溅射功率对AZO薄膜性能的影响OA北大核心CSCDCSTPCD
Effects of substrate temperature and sputtering power on properties of AZO films
采用RF磁控溅射法在载玻片上制备了可用于电极材料的掺Al氧化锌(AZO)透明导电薄膜,并对不同衬底温度和溅射功率下制备的AZO薄膜结构、光电性能进行了表征分析.结果表明:各种工艺条件下沉积的AZO薄膜均具有明显的(002)择优取向,没有改变ZnO六方纤锌矿结构;薄膜电阻率随衬底温度升高而减小,随溅射功率增加先减小后增大,衬底温度400oС、溅射功率200W时最小,为1.53×105Ω·m;可见光平均透射率均在80%以上,光学带隙与载流子浓度变化趋…查看全部>>
Al-doped ZnO (AZO)transparent conductive films for electrode materials were prepared on glass slides by RF magnetron sputtering method. Structural, optical, and electrical properties of the films deposited under different substrate temperatures and sputtering power were characterized and analyzed. The results show that films deposited under various conditions have obvious (002) preferred orientation without changing the hexagonal wurtzite structure. The resi…查看全部>>
于军;王航;王晓晶;李钢贤
华中科技大学电子科学与技术系,湖北武汉430074华中科技大学电子科学与技术系,湖北武汉430074华中科技大学电子科学与技术系,湖北武汉430074华中科技大学电子科学与技术系,湖北武汉430074
能源与动力
AZO薄膜磁控溅射衬底温度溅射功率电阻率可见光透射率
AZO filmmagnetron sputteringsubstrate temperaturesputtering powerresistivityvisible transmittance
《华中科技大学学报:自然科学版》 2012 (5)
93-96,101,5
湖北省自然科学基金重点资助项目(2008CDA025).
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