武汉工程大学学报2012，Vol.34Issue(4)：39-42,46,5.DOI:10.3969/j.issn.1674-2869.2012.04.010
基片温度对纳米金刚石薄膜制备的影响
Influence of substrate temperature on preparation of nano-crystalline diamond films
摘要
Abstract
Using multimode resonant cavity microwave plasma CVD apparatus to prepare nano-crystalline diamond thin film at different substrate temperatures, we use scanning electron microscope ( SEM), atomic force microscope ( AFM) and Raman spectroscopy to study the influence of substrate temperature on the properties of nano-crystalline diamond films. The results show that: with the other conditions unchanged, the substrate temperature has a great influence on the properties of the films, the lower substrate temperature is favorable to deposit nano-crystalline diamond films with a better quality, the optimized substrate temperature is about 720 ℃.关键词
微波等离子体/化学气相沉积/纳米金刚石薄膜/沉积温度Key words
microwave plasma/ chemical vapor deposition/ nano-crystalline diamond thin film/ deposition temperature分类
数理科学引用本文复制引用
江川,汪建华,熊礼威,翁俊,苏含,刘鹏飞..基片温度对纳米金刚石薄膜制备的影响[J].武汉工程大学学报,2012,34(4):39-42,46,5.基金项目
国家自然科学基金项目(11175137) （11175137）
