液晶与显示2012，Vol.27Issue(3)：297-302,6.DOI:10.3788/YJYXS20122703.0297
碳纳米球薄膜的场发射特性
Field Emission Characteristics of Carbon Nanometer Ball Films
摘要
Abstract
Carbon nanometer ball films were deposited on Si (100) by microwave plasma chemical vapor deposition. The structure and surface morphology of carbon nanometer ball films was investigated by using Raman spectroscopy and field emission scanning electron microscope. The carbon nanometer ball film was composed of large numbers of about 2~3 μm-length and 100 nm-width amorphous carbon sheets which were intertwined and interwoven with each other into a ball. The field emission testing of carbon nanometer ball films was performed in a high vacuum system, and good field emission properties with a threshold field of 3. 1 V/μm and a current density of 60. 7 mA/cm2 at an electric field of 10 V/μm were obtained from the carbon films. A three electric filed model was applied to explaining reasonably the field emission characteristics of carbon nanometer ball films in the low, middle and high electric field region.关键词
微波等离子体化学气相沉积/碳纳米球薄膜/场发射Key words
microwave plasma chemical vapor deposition/ carbon nanometer ball films/ field emission分类
信息技术与安全科学引用本文复制引用
刘智超,李英爱,王静,顾广瑞,吴宝嘉..碳纳米球薄膜的场发射特性[J].液晶与显示,2012,27(3):297-302,6.基金项目
国家自然科学基金(No.11164031) （No.11164031）
教育部留学归国人员科研启动基金(教外司留[2009]1341) （教外司留[2009]1341）
