人工晶体学报2012，Vol.41Issue(3)：733-736,4.
电沉积过程中Cl-对Cu2O晶粒形貌的影响
Influence of Cl- on the Morphology of Cu2O Films in Electrodeposition Processing
赵文燕 1田传进 1谢志鹏 1汪长安 2李月明1
作者信息
- 1. 景德镇陶瓷学院材料科学与工程学院,景德镇333403
- 2. 清华大学材料科学与工程系,北京100084
- 折叠
摘要
Abstract
Cuprous oxide (Cu2O) thin film were electrodeposited on indium-doped tin oxide (ITO) substrates from a slightly acidic Cu(Ⅱ) acetate solution. The structure of Cu2O were studied by the X-ray diffraction (XRD) and the influence on Cu2O crystal particles morphologies were studied by scanning electron microscopy ( SEM ). A growth mechanism was proposed according to the experimental results. The results show that the Cu2O morphologies evolved from dendritic branching to cube-like with the increasing of the Cl- concentration due to the adsorption of Cl- in different Cu2O crystal surface.关键词
Cu2O/电沉积/形貌/生长机制Key words
Cu2O/ electrodeposition/ morphology/ growth mechanism分类
通用工业技术引用本文复制引用
赵文燕,田传进,谢志鹏,汪长安,李月明..电沉积过程中Cl-对Cu2O晶粒形貌的影响[J].人工晶体学报,2012,41(3):733-736,4.
