河北工业科技2012，Vol.29Issue(4)：203-205,3.
臭氧在氧化铝薄膜生长过程中氧化机理的研究
Theoretical study on oxidation mechanism in depositing alumina thin films using ozone as oxygen source
李淑梅1
作者信息
- 1. 河北能源职业技术学院矿产资源与建筑工程系,河北唐山063004
- 折叠
摘要
Abstract
The initial oxidation mechanism of atomic-layer deposited alumina using ozone as oxygen source is studied by using density functional theory B3LYP method. Calculations show the following reaction pathway is energetically more favorable: the end oxygen atom of ozone coordinates the Al atom, then recombines with the neighboring hydrogen atom of CH3 group, finally releases oxygen molecule to form AlOH group.关键词
臭氧/反应路径/氧化铝/密度泛函理论Key words
ozone/reaction pathway/alumina / density functional theory分类
化学化工引用本文复制引用
李淑梅..臭氧在氧化铝薄膜生长过程中氧化机理的研究[J].河北工业科技,2012,29(4):203-205,3.
