无机材料学报2012，Vol.27Issue(5)：536-540,5.DOI:10.3724/SP.J.1077.2012.00536
靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响
Effect of Target Composition and Sputtering Parameters on Microstructure and Mechanical Properties of Vanadium Carbide Films
摘要
Abstract
To improve the crystalinity and mechanical properties of the films sputtering with carbide target, a series of vanadium carbide films were prepared by magnetron sputtering in an argon atmosphere using the stoichiometric VC target (n(C):n(V)=l:l) and substoichiometric VC target (n(C):n(V)=0.75:l). Energy-dispersive X-ray spectros-copy, X-ray diffraction, scanning electron microscopy and nanoindentation were employed to characterize their composition, microstructure and mechanical properties. The results show that for the VC target (n(C):n(V)=l:1), only when the Ar pressure is between 2.4 Pa and 3.2 Pa, the films can obtain fine crystallized structure and attain high hardness, of which the highest hardness is 28 GPa. For the V-rich VC target, fine crystallized films and high hardness (31.4 GPa) could be gained in lower Ar pressure (0.6-1.8 Pa). Compared with argon pressure and substrate temperature, target composition is the main factor of the film composition, microstructure and mechanical properties, thus proper increasing the content of metal component of the target is a more effective way to get VC films with good crystalinity and high hardness.关键词
碳化钒/薄膜/微结构/力学性能/磁控溅射Key words
vanadium carbide/ film/ microstructure/ mechanical properties/ magnetron sputtering分类
数理科学引用本文复制引用
沈洁,李冠群,李玉阁,李戈扬..靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响[J].无机材料学报,2012,27(5):536-540,5.基金项目
国家自然科学基金(51071104) （51071104）
