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干湿法腐蚀工艺条件下CdTe薄膜光谱研究

宋慧瑾 鄢强

成都大学学报:自然科学版2012,Vol.31Issue(3):267-269,3.
成都大学学报:自然科学版2012,Vol.31Issue(3):267-269,3.

干湿法腐蚀工艺条件下CdTe薄膜光谱研究

Research on Spectrum of Conditions of Dry CdTe. Solar Cells Under and Wet Etching

宋慧瑾 1鄢强2

作者信息

  • 1. 成都大学工业化制造学院,四川成都610106
  • 2. 成都金倍科技有限公司,四川成都610041
  • 折叠

摘要

Abstract

The surface of CdTe thin films was etched by plasma bombardment sputtering and corroded by methyl bromide. The two types of spectnam properties of CdTe thin films were compared under the two con- ditions. The results show that plasma bombardment sputtering can remove the surface oxide layer completely and make the partiches of the thin films more even and compact, which show that compared with methyl bromide corrosion, it can improve micro-roughness of the surface and improve the quality of the crystal par- ticles and the adhesion of the film.

关键词

等离子体/刻蚀/CdTe薄膜/太阳电池

Key words

plasma/etching/CdTe thin film/solar cells

分类

信息技术与安全科学

引用本文复制引用

宋慧瑾,鄢强..干湿法腐蚀工艺条件下CdTe薄膜光谱研究[J].成都大学学报:自然科学版,2012,31(3):267-269,3.

基金项目

国家自然科学基金(60976052)、四川省教育厅青年科研课题(10ZBl44)资助项目. ()

成都大学学报:自然科学版

1004-5422

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