机械科学与技术2012，Vol.31Issue(11)：1786-1789,4.
反应离子刻蚀法制备石英纳米压印模板的工艺研究
Preparation and Characterization of Nanoimprint Template on Quartz by Reactive Ion Etching
摘要
Abstract
For fabricating sub-wavelength structure by nanoimprint lithography, the templates for ultraviolet (UV) nanoimprint lithography were prepared by the lithography and the reactive ion etching (RIE) technology on quartz substrates and the influence of the process parameters on photoresist and etching rate was investigated. The surface micrograph of the etched patterns was observed by laser scanning confocal microscope (LSCM) and atomic force microscope (AFM). It is shown that the UV nanoimprint lithography templates fabricated in this work at the opti- mum process parameter are highly uniform and symmetrical. The UV transmittance properties of the templates were measured by a scanning spectrophotometer. The results demonstrate that the UV transmittance of the etched tem- plate is still over 90% at the wavelength of 365 nm.关键词
光刻/反应离子刻蚀/刻蚀速率/亚波长结构/紫外纳米压印Key words
lithography/reactive ion etching/etching rate/sub-wavelength structure/ultraviolet nanoimprint分类
信息技术与安全科学引用本文复制引用
张少峰,刘正堂,李阳平,陈海波,徐启远..反应离子刻蚀法制备石英纳米压印模板的工艺研究[J].机械科学与技术,2012,31(11):1786-1789,4.基金项目
航空科学基金项目（2008ZE53043）资助 （）
