物理学报2012，Vol.61Issue(17)：252-260,9.
大口径多层介质膜光栅衍射效率测量及其在制作工艺中的应用
Diffraction efficiency measurement of large aperture multilayer dielectric grating and its application in the fabrication process
摘要
Abstract
Large aperture multilayer dielectric grating （MDG） is one of the key elements of high-power laser systems. In order to meet the requirements for large aperture MLG in a high-power laser system, a diffraction efficiency measurement system is developed for characterizing the diffraction efficiency of large MDG at 1064 nm and Littrow mounting. Through analyzinge the main factors such as detector signal-to-noise ratio and operating staff, which influence the testing results during measurement, their difference is obtained to be less than ±1%, which proves that the method can be used to measure the diffraction efficiency of MDG. Based on a large number of experimental data, the optical characterization of MDG in a negative first-order Littrow configuration could provide some information about grating microstructure. So the diffraction efficiency measurements have a number of important applications in the fabrication process, as a nondestructive grating inspection tool, such as determining the suitable photoresist grating mask which meet the ion beam etching requirements, on line end-point detection during ion beam etching, and judging whether another etching is needed. Based on above techniques, a number of MDGs have been achieved, each of which has mean diffraction efficiency greater than 95% line density 1740 lines/mm, and aperture up to 430 mm×350 mm. The results show that this method can satisfy the requirements for simple operation, testing speediness and preciseness, in which any inspection is not necessary for the MDG microstructure paramters.关键词
衍射效率/多层介质膜光栅/离子束刻蚀Key words
diffraction efficiency/multilyer dielectric grating/ion beam etching分类
数理科学引用本文复制引用
周小为,刘颖,徐向东,邱克强,刘正坤,洪义麟,付绍军..大口径多层介质膜光栅衍射效率测量及其在制作工艺中的应用[J].物理学报,2012,61(17):252-260,9.基金项目
国家高技术研究发展计划（批准号：2007AA1416）和国家自然科学基金（批准号：10875128）资助的课题 （）
