光学精密工程2012，Vol.20Issue(11)：2380-2388,9.DOI:10.3788/OPE.20122011.2380
全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律
Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings
摘要
Abstract
To analyze the principle of profile formation for grating masks and the evolution of photoresist response curves, a simulation model of profile formation for grating masks in development was established. Based on the difference of photoresist dissolution rate in the different regions, the complete photoresist curve was divided into three sections, the effect of each section in the profile formation of grating masks was analyzed, then the simulation surface-relief profile model was presented. The experimental results indicate that the groove profile inclines to be rectangular or trapezoidal when thenonlinearity of photoresist response curve is remarkable, and the groove depth is mainly decided by the initial photeresist thickness. The groove profile is sinusoidal when the linearity response is strong, and the groove depth is also always decreased under this condition. The experiment shows that the proposed model can predict the profile evolution for the different photoresist curves and it provides a directive theory for fabricating the various profile masks during development according to the different photoresist response curves.关键词
全息光栅/非线性效应/槽深/掩模槽形/光刻胶Key words
holographic grating/ nonlinearity effect/ groove depth/ grating mask/ photoresist分类
数理科学引用本文复制引用
韩建,巴音贺希格,李文昊,孔鹏..全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律[J].光学精密工程,2012,20(11):2380-2388,9.基金项目
国家自然科学基金资助项目(No.60478034) （No.60478034）
国家创新方法工作专项资助项目(No.2008IM040700) （No.2008IM040700）
国家重大科学仪器设备开发专项资助项目(No.2011YQ120023) （No.2011YQ120023）
中国科学院知识创新工程资助项目(No.100132H100) （No.100132H100）
