强激光与粒子束2012，Vol.24Issue(10)：2459-2463,5.DOI:10.3788/HPLPB20122410.2459
氧回旋离子束刻蚀化学气相沉积金刚石膜
Etching of CVD diamond films using oxygen cyclotron ion beams
摘要
Abstract
CVD diamond thick films were etched by oxygen cyclotron ion beams and polished by mechanical methods and the effect was investigated. The influences of gas pressure and bias voltage of anode cylinders on the ion parameters were studied by an ion sensitive probe. The etching of CVD diamond films was accomplished under the optimized gas pressure and bias voltage of the anode cylinder. The optimized gas pressure and bias voltage of the anode cylinder for diamond etching are 0. 03 Pa and 200 V, respectively. Under these conditions, the ion temperature is 7. 38 eV and the ion density is 23. 8×1010cm-3. The diamond film was etched for 4 h by the oxygen cyclotron ion beam under temperature of the sample holder of 600℃ and then polished for 15 min by mechanical lapping. The results show that the diamond surface roughness decreases from 3. 525 μm to 2. 512 μm by ion beam etching, and then decreases to 0. 517 μm by mechanical polishing. The eificiency of mechanical polishing is dramatically improved when the diamond film is etched by oxygen cyclotron ion beams.关键词
离子灵敏探针/离子温度/金刚石膜/刻蚀/回旋离子束Key words
ion sensitive probe/ ion temperature/ diamond film/ etching/ cyclotron ion beam分类
化学化工引用本文复制引用
吴俊,马志斌,沈武林..氧回旋离子束刻蚀化学气相沉积金刚石膜[J].强激光与粒子束,2012,24(10):2459-2463,5.基金项目
国家自然科学基金项目(10875093) （10875093）
