人工晶体学报2012，Vol.41Issue(4)：868-871,4.
工艺参数对高功率MPCVD金刚石膜择优取向的影响研究
Effects of Process Parameters on the Preferred Orientation of Diamond Films Deposited by MPCVD
摘要
Abstract
Polycrystalline diamond film was grown by using H2-CH4 as the source gas in a newly developed ellipsoidal MPCVD reactor at an input microwave power of 8 kW, different methane concentration, deposition temperature and gas flow. The selectivity of crystal orientation was examined by using X-ray diffraction. The results show that the change of process parameters have a significant effect on preferred orientation of diamond films at high microwave power. When CH4 concentration increased from 0.5% to 1%, the preferred (200) growth orientation of the diamond films was changed to (111) orientation. However, the (111) orientation changed to (220) and (311) preferred orientations when the CH4 concentration increased from 1.0% to 2.5%. In the temperature range of 700-1050 Tl, (111) preferred growth orientation was enhanced as the temperature increasing. At 1050 X. and above, the diamond films grow at (100) preferred orientation instead of (111) preferred orientation. Moreover, the preferred (111) orientation of the diamond films was enhanced as the gas flow rate increases from 200 to 1000 seem, whereas it showed a decrease when the gas flow increased to 1000 seem and above.关键词
金刚石膜/高功率MPCVD/工艺参数/择优取向Key words
diamond film/ MPCVD/ process parameters/ preferred orientation分类
数理科学引用本文复制引用
于盛旺,刘艳青,唐伟忠,申艳艳,贺志勇,唐宾..工艺参数对高功率MPCVD金刚石膜择优取向的影响研究[J].人工晶体学报,2012,41(4):868-871,4.基金项目
国家自然科学基金(51071106) （51071106）
