西北师范大学学报（自然科学版）2012，Vol.48Issue(6)：30-35,6.
TiO2缓冲层的退火气氛对ZnO薄膜微结构和光学性能的影响
Effects of TiO2 buffer layer annealed in different ambient on the microstructure and optical properties of ZnO films
摘要
Abstract
ZnO films using TiO2 buffer layers were deposited on Si substrate by radio frequency (RF) reactive magnetron sputtering. Buffer layers were annealed in vacuum and oxygen, respectively. The effect of the ambient gas during the thermal annealing after the growth of TiO2 buffer layers on the microstructure and optical properties of ZnO films were characterized by X-ray diffraction (XRD) , ultraviolet-visible spectrophotometer and fluorescence spectrophotometer. All films have an average optical transparency over 90% in the visible range, meanwhile the optical band gaps first increases whenTiO2 buffer layer was introduced, then decreases as buffer layer was annealed in vacuum and oxygen, respectively. Peaks located at 400 nm, 450 nm and 530 nm have been observed from all samples. The origin of these emissions is discussed.关键词
ZnO薄膜/TiO2缓冲层/退火气氛/光致发光谱Key words
ZnO film/ TiO2 buffer layer/ annealing atmosphere/ photoluminescence分类
数理科学引用本文复制引用
马书懿,张小雷,杨付超,黄新丽,马李刚,李发明,赵强,刘静..TiO2缓冲层的退火气氛对ZnO薄膜微结构和光学性能的影响[J].西北师范大学学报（自然科学版）,2012,48(6):30-35,6.基金项目
国家自然科学基金资助项目(10874140) （10874140）
甘肃省自然科学基金资助项目(0710RJZA105) （0710RJZA105）
