表面技术2012，Vol.41Issue(6)：1-3,6,4.
负偏压对电弧离子镀复合TiAlN薄膜的影响
Influence of Negative Bias on TiAlN Films by Arc Ion Plating
摘要
Abstract
TiAIN thin films were fabricated via arc ion plating on the W18&4V high-speed steel under different negative biases. The influence of negative bias on the microstructure, phase, and crystalline orientation, hardness, and deposition rate of the films were investigated. The results show that the films have a coarse surface at too high or too low biases, resulting in lower hardness. The largest deposition rate is achieved at -200 V bias. The TiAIN thin film has a (111) preferred orientation when deposited at ?50 V bias, where the largest hardness is achieved.关键词
电弧离子镀/TiAlN薄膜/负偏压Key words
arc ion plating/ TiAIN thin film/ negative bias分类
矿业与冶金引用本文复制引用
黄美东,许世鹏,刘野,薛利,潘玉鹏,范喜迎..负偏压对电弧离子镀复合TiAlN薄膜的影响[J].表面技术,2012,41(6):1-3,6,4.基金项目
国家自然科学基金(61078059) （61078059）
天津师范大学创新计划项目(52X09038) （52X09038）
