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Capacitance and conductance dispersion in AlGaN/GaN heterostructure

Yan Dawei Wang Fuxue Zhu Zhaomin Cheng Jianmin Gu Xiaofeng

半导体学报(英文版)2013,Vol.34Issue(1):35-38,4.
半导体学报(英文版)2013,Vol.34Issue(1):35-38,4.DOI:10.1088/1674-4926/34/1/014003

Capacitance and conductance dispersion in AlGaN/GaN heterostructure

Capacitance and conductance dispersion in AlGaN/GaN heterostructure

Yan Dawei 1Wang Fuxue 1Zhu Zhaomin 1Cheng Jianmin 1Gu Xiaofeng1

作者信息

  • 1. Key Laboratory of Advanced Process Control for Light Industry(Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China
  • 折叠

摘要

Abstract

The dispersion mechanism in Alo.27Gao.73N/GaN heterostructure was investigated using frequencydependent capacitance and conductance measurements.It was found that the significant capacitance and conductance dispersion occurred primarily for measurement frequency beyond ~ 100 kHz before the channel cutoff at the interface,suggesting that the vertical polarization electrical field under the gate metal should be closely related with the observed dispersive behavior.According to the Schottky-Read-Hall model,a traditional trapping mechanism cannot be used to explain our result.Instead,a piezoelectric polarization strain relaxation model was adopted to interpret the dispersion.By fitting the obtained capacitance data,the corresponding characteristic time and charge density were determined ~ 10-8 s and ~ 5.26 × 1012 cm-2 respectively,in good agreement with the conductance data and theoretical prediction.

关键词

capacitance dispersion/AlGaN/GaN heterostructure/strain relaxation model

Key words

capacitance dispersion/AlGaN/GaN heterostructure/strain relaxation model

引用本文复制引用

Yan Dawei,Wang Fuxue,Zhu Zhaomin,Cheng Jianmin,Gu Xiaofeng..Capacitance and conductance dispersion in AlGaN/GaN heterostructure[J].半导体学报(英文版),2013,34(1):35-38,4.

基金项目

Project supported by the Fundamental Research Funds for the Central Universities of China (Nos.JUSRP111A42,JUSRP211A37,JUSRP20914,JUSRP11230),the State Key Laboratory of ASIC & System,China (No.11KF003),and the Natural Science Foundation of Jiangsu Province,China (No.BK2012110). (Nos.JUSRP111A42,JUSRP211A37,JUSRP20914,JUSRP11230)

半导体学报(英文版)

OACSCDCSTPCDEI

1674-4926

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