表面技术2013，Vol.42Issue(1)：85-87,3.
温度及扩散时间对CVD法制备高硅钢的影响
Influence of Temperature and Diffusion Time on Manufacturing Procedure of High Silicon Steel by CVD Method
王旭 1张帆 2朱合范 1潘红良1
作者信息
- 1. 华东理工大学,上海200237
- 2. 萨省大学,加拿大萨斯卡通S7H2Z4
- 折叠
摘要
Abstract
6.5% Si high silicon steel was manufactured by using CVD method and the process was introduced, the influence of temperature on the siliconizing rate and quality reducing rate, diffusion time on silicon distribution were investigated. Results as follows: the siliconizing rate will increase quickly when the temperature is higher than 1050℃ ,but the siliconizing rate will become steadily as the temperature up to 1200℃ ; The quality reducing rate will increase with the elevating of temperature and the rate will become steadily when the temperature is higher than 1200℃; The silicon will be well-distributed as the diffusion time is very sufficient, but it will be the highest efficient time when the Aw表-中/b≤5.关键词
6.5％ Si高硅钢/CVD/温度/扩散时间Key words
6.5% silicon steel/ CVD/ temperature/ diffusion time分类
矿业与冶金引用本文复制引用
王旭,张帆,朱合范,潘红良..温度及扩散时间对CVD法制备高硅钢的影响[J].表面技术,2013,42(1):85-87,3.
