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The Effect of Discharge Power on the Atmospheric Pressure Non-equilibrium Ar/O2/TiCl4 Plasma Deposition of TiO2 Film

WANG De-xin YANG Qin-yu GUO Ying DING Ke ZHANG Jing

东华大学学报（英文版）2012，Vol.29Issue(5)：389-392,4.

The Effect of Discharge Power on the Atmospheric Pressure Non-equilibrium Ar/O2/TiCl4 Plasma Deposition of TiO2 Film

WANG De-xin ¹YANG Qin-yu ²GUO Ying ²DING Ke ²ZHANG Jing¹

作者信息

1. State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Material Science and Engineering,Donghua University, Shanghai 201620, China
2. College of Science, Donghua University, Shanghai 201620, China
折叠

摘要

关键词

atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma/TiO2/discharge power

Key words

atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma/TiO2/discharge power

分类

数理科学

引用本文复制引用

WANG De-xin,YANG Qin-yu,GUO Ying,DING Ke,ZHANG Jing..The Effect of Discharge Power on the Atmospheric Pressure Non-equilibrium Ar/O2/TiCl4 Plasma Deposition of TiO2 Film[J].东华大学学报（英文版）,2012,29(5):389-392,4.

基金项目

National Natural Science Foundations of China (No.10835004,No.10775031) （No.10835004,No.10775031）

Science and Technology Commission of Shanghai Municipality,China (No.10XD1400100) （No.10XD1400100）

东华大学学报（英文版）

ISSN：1672-5220

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